Pure & Ultra-pure Water
Ultra-pure Water Equipment
RO + EDI / mixed-bed polishing systems reaching 18.25 MΩ·cm for semiconductor, PV and precision electronics.
- Capacity
- 0.25 – 50 T/H (customised)
- Outlet Quality
- Resistivity up to 18.25 MΩ·cm @ 25 °C
Ultra-pure water equipment produces water of the highest purity grade by combining reverse osmosis with electrodeionization (EDI) or mixed-bed ion exchange, followed by UV oxidation, ultrafiltration and terminal 0.22 μm filtration.
The system is designed for industries where trace ions, TOC, particles and bacteria directly affect yield — semiconductor wafer cleaning, photovoltaic cell production, lithium battery manufacturing, LCD panel rinsing, laboratory reagent water and precision optical cleaning.
EDI modules replace acid and alkali regeneration entirely, so there is no chemical storage, no regeneration wastewater and no corresponding environmental permit burden. A recirculating polishing loop keeps the water at target resistivity even during idle periods.
Key Features
Why This System Performs
18.25 MΩ·cm resistivity
Two-stage RO plus EDI or polishing mixed bed reaches theoretical maximum resistivity with TOC below 10 ppb.
Chemical-free regeneration
EDI is continuously regenerated by electrical current — no acid, no alkali, no regeneration wastewater.
Sanitary distribution loop
316L polished loop with continuous circulation, UV 185 nm / 254 nm and terminal filtration prevents stagnation and bacterial regrowth.
Online quality assurance
Resistivity, TOC, temperature and flow are monitored in real time with automatic diversion when values fall out of specification.
Process
Typical Process Flow
- 01Raw water tank
- 02Multi-media + activated carbon pre-treatment
- 03Softener / antiscalant dosing
- 04Security filter
- 05First-stage reverse osmosis
- 06Intermediate tank + pH adjustment
- 07Second-stage reverse osmosis
- 08EDI module (or mixed-bed polisher)
- 09UV sterilizer 254 nm / TOC UV 185 nm
- 10Polishing resin + 0.22 μm terminal filter
- 11Ultra-pure water circulation loop to use points
Specifications
Technical Data
| Water production | 0.25 – 50 T/H, customised |
|---|---|
| Resistivity | 15 – 18.25 MΩ·cm @ 25 °C |
| TOC | ≤ 10 ppb |
| Particles | ≤ 1 pcs/mL (> 0.1 μm) with terminal filtration |
| Bacteria | ≤ 1 cfu/mL |
| Polishing | EDI module or nuclear-grade mixed-bed resin |
| Loop material | SUS316L sanitary polished, Ra ≤ 0.4 μm, or PVDF |
| Control | PLC, HMI, online resistivity / TOC instruments |
Applications
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